POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM

• Main Authors: CHOI, GYUNG SIK, CHO, OH HYOUNG, PARK, SEOK BONG, KIM, YEON OK, KWEON, O YOUNG
• Format: Patent
• Language: English; Korean
• Published: 10.03.2015
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The present invention relates to a positive type photosensitive resin and a hardening film manufactured therefrom. In the present invention, provided are a positive type photosensitive resin, which comprises (1) at least one copolymer, including at least one configuration unit selected from a group of consisting of (1-1) a configuration unit derived from an unsaturated monomer containing a carboxyl group, (1-2) a configuration unit derived from an unsaturated monomer including at least one epoxy group and (1-3) a configuration unit derived from an unsaturated monomer containing a phenolic hydroxyl group, and having (1-4) a configuration unit derived from an unsaturated monomer different from each configuration unit of (1-1) and (1-3); (2) a photosensitizer; and (3) a compound of chemical formula 1, thereby having a high sensitivity film and an outstanding pattern forming property without scum and being used for manufacturing a hardening film used as an insulation film for a liquid crystal display device.