IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE

• Main Author: SHINODA KEN ICHIRO
• Format: Patent
• Language: English; Korean
• Published: 21.01.2015
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; SEMICONDUCTOR DEVICES; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

The present invention relates to an imprint apparatus, which forms a pattern on an imprint material on a substrate by using a mold. The present invention provides an imprint apparatus, which comprises a first optical member, which is interposed between an illumination optical system and a detection optical system, and a mold, and configured to guide first light from the illumination optical system and second light from the detection optical system to the mold; and a second optical member, which is interposed between the first optical member and the detection optical system, and transmits the second light reflected by the mark formed on the mold or the mark formed on the substrate and progressing toward the detection optical system via the first optical member, while blocking the first light progressing toward the detection optical system via the first optical member.