PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX BY THE COMPOSITION AND DISPLAY DEVICE INCLUDING THE BLACK MATRIX

The present invention relates to a black matrix. The optical density of the black matrix at the wavelength 550nm has an OD value which is more than one for the pattern film thickness of 1um. The optical density at the wavelength 950nm is between 15% and 60%. The present invention can form a pattern...

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Bibliographic Details
Main Authors PARK, SEUL KI, LEE, SOON A, LEE, JONG SOO, KIM, HUN SIK
Format Patent
LanguageEnglish
Korean
Published 30.12.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
ELECTROGRAPHY
FREQUENCY-CHANGING
HOLOGRAPHY
MATERIALS THEREFOR
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICAL LOGIC ELEMENTS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Summary:The present invention relates to a black matrix. The optical density of the black matrix at the wavelength 550nm has an OD value which is more than one for the pattern film thickness of 1um. The optical density at the wavelength 950nm is between 15% and 60%. The present invention can form a pattern by an UV exposure process and has a very low transmittance in the visible wave band while exhibiting a predetermined transmittance in the infrared wave band. Accordingly, an alignment key can be easily checked when a color filter pattern and a black matrix is formed.
Bibliography:Application Number: KR20130070961