IMPRINTING METHOD, IMPRINTING APPARATUS, AND DEVICE MANUFACTURING METHOD

• Main Authors: HIURA MITSURU, SATO HIROSHI
• Format: Patent
• Language: English; Korean
• Published: 05.12.2014
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; PERFORMING OPERATIONS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

An imprinting method according to the present invention comprises the steps of: supplying a imprinting material on a substrate having a pattern which includes a mark of the substrate, the mark being formed on the pattern; bring the imprinting material into contact with a mold having a pattern, which includes a mark of the mold; curing the imprinting material while the mold contacts the imprinting material; and forming a pattern, which includes a mark, on the imprinting material. The imprinting method is characterized in that a space between the substrate and the mold is increased until mark of the mold is positioned to be out of a depth of focus of the optical system, and then the mark of the imprinting material and the mark of the substrate are detected by using an optical system, configured to form an image of a mark of the imprinting material and an image of a mark of the substrate, and thus a deviation in a relative position between a pattern on the substrate and a pattern on the imprinting material can be obtained.