NOVEL COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION

A novel compound having satisfactory sensitivity (base generating performance), a photosensitive resin composition containing the compound as a photo-initiator, and a cured product of the composition are provided. Specifically, a compound represented by general formula (1) (compound (1)), a photosen...

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Bibliographic Details
Main Authors SAWAMOTO DAISUKE, KIMIJIMA KOICHI, SHINANO HIROKATSU, OISHI TAKEO, TOMINAGA NOBUHIDE
Format Patent
LanguageEnglish
Korean
Published 04.12.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
ELECTROGRAPHY
HETEROCYCLIC COMPOUNDS
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A novel compound having satisfactory sensitivity (base generating performance), a photosensitive resin composition containing the compound as a photo-initiator, and a cured product of the composition are provided. Specifically, a compound represented by general formula (1) (compound (1)), a photosensitive resin composition containing (A) a photo-initiator comprising at least one compound (1) and (B) a photosensitive resin are provided. Preferred are the compound (1) in which R 1 is an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, the compound (1) in which at least one of R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 is nitro, and the compound (1) in which n is 0. The symbols in general formula (1) are as defined in the description.
Bibliography:Application Number: KR20147024458