METHOD FOR FORMING HOLE IN SUBSTRATE AND APPARATUS FOR FORMING HOLE IN SUBSTRATE

Provided by an embodiment of the present invention is a method to form a hole in a substrate which: includes a base member including glass fiber and a resin material; and has a conductive layer formed on the base member. The substrate hole forming method includes: a step of exposing a part of a base...

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Bibliographic Details
Main Authors JANG, JAE HOON, KWON, SOON CHUL
Format Patent
LanguageEnglish
Korean
Published 17.11.2014
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Summary:Provided by an embodiment of the present invention is a method to form a hole in a substrate which: includes a base member including glass fiber and a resin material; and has a conductive layer formed on the base member. The substrate hole forming method includes: a step of exposing a part of a base member by removing a part to form a hole from a part of a conductive layer; a primary resin removing step of removing a resin material by spraying first resin etching liquid to a part of the exposed base member by using a first flow device while immersing a substrate in the first resin etching liquid; a glass fiber removing step of removing glass fiber of the part of the exposed base member by spraying glass fiber etching liquid to the substrate; and a secondary resin removing step of removing the resin material by spraying second resin etching liquid to the exposed base member by using a second flow device while immersing the substrate in the second resin etching liquid.
Bibliography:Application Number: KR20130051498