METHOD AND APPARATUS FOR MEASURING THE WAVEFRONT OF AN OPHTHALMIC DEVICE

This invention provides for a method and a wavefront measuring apparatus used to measure, in one or continuous measurements, one or more ophthalmic devices directly on a forming mandrel, in non-hydrated state and in a much faster way with high spatial resolution.

Saved in:

Bibliographic Details
Main Authors	AGARWAL NAVEEN, WIDMAN MICHAEL F
Format	Patent
Language	English Korean
Published	29.10.2014
Subjects	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
Online Access	Get full text

Cover

Loading…

More Information
Summary:	This invention provides for a method and a wavefront measuring apparatus used to measure, in one or continuous measurements, one or more ophthalmic devices directly on a forming mandrel, in non-hydrated state and in a much faster way with high spatial resolution.
Bibliography:	Application Number: KR20147025235