ION SOURCE, METHOD FOR OPERATING ION SOURCE AND ELECTRON GUN

Provided in the present invention is an ion source which comprises at least one electron gun. The electron gun comprises an electron source for generating an electron beam and an entrance for receiving a gas. Additionally, the electron gun comprises a plasma area defined by at least an anode and a g...

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Bibliographic Details
Main Authors HORSKY THOMAS N, HAHTO SAMI K
Format Patent
LanguageEnglish
Korean
Published 24.09.2014
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:Provided in the present invention is an ion source which comprises at least one electron gun. The electron gun comprises an electron source for generating an electron beam and an entrance for receiving a gas. Additionally, the electron gun comprises a plasma area defined by at least an anode and a grounding element, wherein the plasma area can form plasma from a gas received through the entrance. The plasma can be maintained by at least one part of the electron beam. The electron gun additionally comprises an exit for delivering at least one among (i) ions generated by the plasma and (ii) at least one part of the electron beam generated by the electron source.
Bibliography:Application Number: KR20130152349