LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometr...

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Bibliographic Details
Main Authors BEERENS RUUD, FISCHER OLOF, BUTLER HANS, HOEKS MARTINUS, BLEEKER ARNO, VAN DER WIJST MARC, AANGENENT WOUTER, ZAAL KOEN, VAN DER SCHOOT HARMEN, SLAGHEKKE BERNARDUS, TINNEMANS PATRICIUS, BOSCH NIELS JOHANNES MARIA, HOL SVEN ANTOIN JOHAN, HENNUS PIETER, CADEE THEODORUS PETRUS MARIA
Format Patent
LanguageEnglish
Korean
Published 04.09.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
Bibliography:Application Number: KR20147018844