SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
The present invention suggests a semiconductor device comprising a substrate; a buffer layer formed on the substrate for alleviating stress exerted on the plate when cutting the substrate; and an element layer formed on the buffer layer, and including either one of at least one layer of an insulatin...
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Main Authors | , |
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Format | Patent |
Language | English Korean |
Published |
01.09.2014
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention suggests a semiconductor device comprising a substrate; a buffer layer formed on the substrate for alleviating stress exerted on the plate when cutting the substrate; and an element layer formed on the buffer layer, and including either one of at least one layer of an insulating layer or at least one layer of a conductive layer, and a method for manufacturing the same. |
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Bibliography: | Application Number: KR20130018391 |