METHOD OF TREATING A SURFACE AND CERAMIC STRUCTURE USEOF

In a method of treating a surface, a low hardness ceramic coating layer having a first hardness is formed on a basic material. A plasma process is performed on the upper surface of the low hardness ceramic coating layer by using a plasma torch. The upper part of the low hardness ceramic coating laye...

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Bibliographic Details
Main Authors MOON, JANG WON, YE, KYUNG HWAN, SHIN, DONG HEE, JANG, KYUNG IC, JUNG, CHAE JONG
Format Patent
LanguageEnglish
Korean
Published 14.08.2014
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:In a method of treating a surface, a low hardness ceramic coating layer having a first hardness is formed on a basic material. A plasma process is performed on the upper surface of the low hardness ceramic coating layer by using a plasma torch. The upper part of the low hardness ceramic coating layer is changed into a ceramic coating layer having a second hardness which is higher than the first hardness. Next, the upper surface of the ceramic coating layer is polished to have the surface roughness of 0.05 to 1.00 micrometer.
Bibliography:Application Number: KR20130012718