SYSTEM AND METHOD FOR TUNGSTEN HEXAFLUORIDE RECOVERY AND REUSE

• Main Authors: LEHMANN JOHN FRANCIS, CASTEEL JR. WILLIAM JACK, KARWACKI JR. EUGENE JOSEPH, AHN, HEUI BOK, WINCHESTER DAVID CHARLES, AGARWAL RAJIV KRISHAN, JOHNSON ANDREW DAVID
• Format: Patent
• Language: English; Korean
• Published: 25.07.2014
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INORGANIC CHEMISTRY; METALLURGY; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SEMICONDUCTOR DEVICES; SEPARATION; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; THEIR RELEVANT APPARATUS; TRANSPORTING

Condensable materials, such as but not limited to, tungsten hexafluoride (WF6) can be used for depositing a film in a chemical vapor deposition (CVD) process. In the present invention, disclosed is a method for collecting and reusing the materials rather than treating the condensable materials which are not reacted in a production process as waste. In one concrete embodiment, when the condensable materials such as gaseous WF6 are not supplied to a CVD reactor, the condensable materials are induced to a collection cabinet for capturing.