TUNING A PARAMETER ASSOCIATED WITH PLASMA IMPEDANCE

• Main Authors: VALCORE JR. JOHN C, LYNDAKER BRADFORD J
• Format: Patent
• Language: English; Korean
• Published: 21.07.2014
• Subjects: BASIC ELECTRONIC CIRCUITRY; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; RESONATORS

Disclosed are a system and a method for tuning plasma which is associated with a plasma impedance. One of methods includes a step of receiving information in order to determine a variable. Information is measured in a transmission line in case a parameter has a first value. The transmission line is used when providing electric power to a plasma chamber. The method further includes the following steps of: determining whether a variable is in a local minimum value or not; and providing a first value in order to tune an impedance matching circuit in case the variable is in the local minimum value. The method also includes the following steps of: changing the first value into a second value of a parameter in case the variable is not in the local minimum value; and determining whether the parameter is in the local minimum value or not in case the parameter has the second value.