TUNING A PARAMETER ASSOCIATED WITH PLASMA IMPEDANCE
Disclosed are a system and a method for tuning plasma which is associated with a plasma impedance. One of methods includes a step of receiving information in order to determine a variable. Information is measured in a transmission line in case a parameter has a first value. The transmission line is...
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Main Authors | , |
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Format | Patent |
Language | English Korean |
Published |
21.07.2014
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Subjects | |
Online Access | Get full text |
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Summary: | Disclosed are a system and a method for tuning plasma which is associated with a plasma impedance. One of methods includes a step of receiving information in order to determine a variable. Information is measured in a transmission line in case a parameter has a first value. The transmission line is used when providing electric power to a plasma chamber. The method further includes the following steps of: determining whether a variable is in a local minimum value or not; and providing a first value in order to tune an impedance matching circuit in case the variable is in the local minimum value. The method also includes the following steps of: changing the first value into a second value of a parameter in case the variable is not in the local minimum value; and determining whether the parameter is in the local minimum value or not in case the parameter has the second value. |
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Bibliography: | Application Number: KR20140004239 |