LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND STORAGE MEDIUM FOR LIQUID PROCESSING

A filtration efficiency, which is similar to the filtration efficiency obtained when a plurality of filters are provided, can be obtained by one filter, and decrease in throughput can be prevented. Based on a control signal from a control unit (101), a resist liquid (L) is sucked into a pump (70) th...

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Main Authors MINEKAWA YUKIE, TAKAYANAGI KOJI, YOSHIDA YUICHI, SASA TAKASHI, YOSHIHARA KOUSUKE, FURUSHO TOSHINOBU, TERASHITA YUICHI
Format Patent
LanguageEnglish
Korean
Published 30.06.2014
Subjects
BASIC ELECTRIC ELEMENTS
BLASTING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
HEATING
LIGHTING
MECHANICAL ENGINEERING
POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS
PUMPS
PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
SEMICONDUCTOR DEVICES
WEAPONS
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Summary:A filtration efficiency, which is similar to the filtration efficiency obtained when a plurality of filters are provided, can be obtained by one filter, and decrease in throughput can be prevented. Based on a control signal from a control unit (101), a resist liquid (L) is sucked into a pump (70) through a filter. A part of the resist liquid sucked in the pump is discharged from a discharge nozzle (7). The remaining resist liquid is returned to a supply conduit (51b) on a primary side of the filter. A process is synthesized by adding a replenishment amount equal to the discharge amount to the return amount. The discharge of the synthesized resist liquid and the filtration thereof by the filter are performed the number of times corresponding to a rate between the discharge amount and the return amount.
Bibliography:Application Number: KR20140064224