WAFER HOLDER CLEANING APPARATUS AND FILM DEPOSITION SYSTEM

A wafer holder cleaning apparatus according to an embodiment of the present invention includes a housing part which comprises an entrance which receives and outputs a wafer holder; a door part which selectively opens and closes the entrance; a support part which is formed in the housing and where th...

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Bibliographic Details
Main Authors KIM, CHOO HO, JI, WON SOO, BANG, SANG KYU, KWAK, SUNG DON
Format Patent
LanguageEnglish
Korean
Published 22.05.2014
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A wafer holder cleaning apparatus according to an embodiment of the present invention includes a housing part which comprises an entrance which receives and outputs a wafer holder; a door part which selectively opens and closes the entrance; a support part which is formed in the housing and where the wafer holder received through the entrance is located; and a cleaning part which cleans the surface of the wafer holder.
Bibliography:Application Number: KR20120128614