THERMAL ACID GENERATORS FOR USE IN PHOTORESISTS

Provided is a new photoresist composition which comprises a component containing a thermal acid generator and a quencher. A desirable photoresist of the present invention comprises a resin having a photoacid-labile group; a photoacid generator compound; and at least one thermal acid generator and at...

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Bibliographic Details
Main Authors XU CHENG BAI, LIU CONG, PROKOPOWICZ GREGORY P, WU CHUNYI, POHLERS GERHARD
Format Patent
LanguageEnglish
Korean
Published 09.05.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:Provided is a new photoresist composition which comprises a component containing a thermal acid generator and a quencher. A desirable photoresist of the present invention comprises a resin having a photoacid-labile group; a photoacid generator compound; and at least one thermal acid generator and at least one quencher which can improve the line width roughness and photospeed.
Bibliography:Application Number: KR20130130168