FACILITY AND METHOD FOR DEPOSITING A WIDTH-ADJUSTABLE FILM OF ORDERED PARTICLES ONTO A MOVING SUBSTRATE

• Main Authors: FUGIER PASCAL, CORONEL PHILIPPE, DELLEA OLIVIER
• Format: Patent
• Language: English; Korean
• Published: 28.04.2014
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; PERFORMING OPERATIONS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

A facility for depositing a film of ordered particles onto a moving substrate, the facility configured to allow deposition, onto the substrate, of a film of ordered particles escaping from a particle outlet of a transfer zone having a first width. The facility further includes an accessory device in a form of a deposit head, provided to seal the particle outlet and configured to allow the deposition, onto the substrate, of a film of ordered particles escaping from an end of a particle transfer channel of the deposit head, the end having a second width strictly lower than the first width.