INSPECTING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
There is provide an inspection apparatus configured to detect a change in shape of a pattern in the depth direction o the pattern, the apparatus including: an illumination section 20 which illuminates a wafer 5 having a periodic pattern with an illumination light having transmittance with respect to...
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Main Author | |
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Format | Patent |
Language | English Korean |
Published |
23.04.2014
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Subjects | |
Online Access | Get full text |
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