INSPECTING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

There is provide an inspection apparatus configured to detect a change in shape of a pattern in the depth direction o the pattern, the apparatus including: an illumination section 20 which illuminates a wafer 5 having a periodic pattern with an illumination light having transmittance with respect to...

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Bibliographic Details
Main Author KUDO YUJI
Format Patent
LanguageEnglish
Korean
Published 23.04.2014
Subjects
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