ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME

Provided is an acid forming agent compound which is useful as a photoresist composition. The acid forming agent compound of the present invention includes cyclic sulfonium salt, and a covalently linked photoacid-labile group. According to one aspect, a thioxanthone acid forming agent compound is par...

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Bibliographic Details
Main Authors RACHFORD AARON A, JAIN VIPUL, LABEAUME PAUL J
Format Patent
LanguageEnglish
Korean
Published 25.03.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:Provided is an acid forming agent compound which is useful as a photoresist composition. The acid forming agent compound of the present invention includes cyclic sulfonium salt, and a covalently linked photoacid-labile group. According to one aspect, a thioxanthone acid forming agent compound is particularly preferred, for example, an acid forming agent compound includes a thioxanthone residual group and one or more covalently bonded acid labile groups.
Bibliography:Application Number: KR20130110992