APPARATUS FOR SEMICONDUCTOR

Disclosed is a semiconductor apparatus that includes a chamber having a lower body and a chamber lid located in the lower body; an upper electrode for applying plasma power. The upper electrode includes a plate-shaped surface part separated from the chamber lid; and a circular-chain connection parts...

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Bibliographic Details
Main Authors PARK, SANG KI, KIM, HIE CHUL, KIM, JONG SIK, KWAK, JAE CHAN
Format Patent
LanguageEnglish
Korean
Published 12.02.2014
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Summary:Disclosed is a semiconductor apparatus that includes a chamber having a lower body and a chamber lid located in the lower body; an upper electrode for applying plasma power. The upper electrode includes a plate-shaped surface part separated from the chamber lid; and a circular-chain connection parts prepared between the chamber lid and the surface part in order to prevent the warpage of the surface part and connected to the chamber lid.
Bibliography:Application Number: KR20140005366