APPARATUS FOR SEMICONDUCTOR
Disclosed is a semiconductor apparatus that includes a chamber having a lower body and a chamber lid located in the lower body; an upper electrode for applying plasma power. The upper electrode includes a plate-shaped surface part separated from the chamber lid; and a circular-chain connection parts...
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Main Authors | , , , |
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Format | Patent |
Language | English Korean |
Published |
12.02.2014
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Subjects | |
Online Access | Get full text |
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Summary: | Disclosed is a semiconductor apparatus that includes a chamber having a lower body and a chamber lid located in the lower body; an upper electrode for applying plasma power. The upper electrode includes a plate-shaped surface part separated from the chamber lid; and a circular-chain connection parts prepared between the chamber lid and the surface part in order to prevent the warpage of the surface part and connected to the chamber lid. |
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Bibliography: | Application Number: KR20140005366 |