HIGH CONDUCTIVITY ELECTROSTATIC CHUCK

In accordance with an embodiment of the invention, there is provided an electrostatic chuck comprising a conductive path covering at least a portion of a workpiece-contacting surface of a gas seal ring of the electrostatic chuck, the conductive path comprising at least a portion of an electrical pat...

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Bibliographic Details
Main Authors DONNELL STEVEN, VENKATRAMAN CHANDRA, SUURONEN DAVID, STONE LYUDMILA, BLAKE JULIAN, STONE DALE K, COOKE RICHARD A
Format Patent
LanguageEnglish
Korean
Published 03.02.2014
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Summary:In accordance with an embodiment of the invention, there is provided an electrostatic chuck comprising a conductive path covering at least a portion of a workpiece-contacting surface of a gas seal ring of the electrostatic chuck, the conductive path comprising at least a portion of an electrical path to ground; and a main field area of a workpiece-contacting surface of the electrostatic chuck comprising a surface resistivity in the range of from about 108 to about 1012 ohms per square.
Bibliography:Application Number: KR20137008752