LIQUID CONTROL APPARATUS AND RETICULAR FORMATION ASSEMBLY FOR LIQUID CONTROL APPARATUS

• Main Authors: KOUKETSU MASAYUKI, OKADA MASAYO, ITAFUJI HIROSHI
• Format: Patent
• Language: English; Korean
• Published: 22.01.2014
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING; NOZZLES; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SEPARATION; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; THEIR RELEVANT APPARATUS; TRANSPORTING

The purposes of the present invention are to provide a liquid control apparatus for improving attachment and removal of reticular formation assemblies, and to adhere the reticular formation assembly closely to the surface of the subject. A liquid gasifier (10) comprises: a first housing having the s...