LIQUID CONTROL APPARATUS AND RETICULAR FORMATION ASSEMBLY FOR LIQUID CONTROL APPARATUS

The purposes of the present invention are to provide a liquid control apparatus for improving attachment and removal of reticular formation assemblies, and to adhere the reticular formation assembly closely to the surface of the subject. A liquid gasifier (10) comprises: a first housing having the s...

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Bibliographic Details
Main Authors KOUKETSU MASAYUKI, OKADA MASAYO, ITAFUJI HIROSHI
Format Patent
LanguageEnglish
Korean
Published 22.01.2014
Subjects
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
ATOMISING APPARATUS
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING
NOZZLES
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
SPRAYING APPARATUS
SPRAYING OR ATOMISING IN GENERAL
THEIR RELEVANT APPARATUS
TRANSPORTING
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Summary:The purposes of the present invention are to provide a liquid control apparatus for improving attachment and removal of reticular formation assemblies, and to adhere the reticular formation assembly closely to the surface of the subject. A liquid gasifier (10) comprises: a first housing having the surface of subject (11a); a heater (70); a mesh (31); first and second holders (34A, 34B) which are attached on outer outline parts facing each other; a stem (38) supported by the first housing to be moved along a fixed direction being inclined to the surface of the subject; a cover bolt (35A); a cover bolt (35B); a coil spring for keeping the mesh close to the surface of the subject; and a cover member (80) for sealing the space around the surface of the subject by covering the mesh from the side heading the surface of the subject.
Bibliography:Application Number: KR20130080891