LIQUID CONTROL APPARATUS AND RETICULAR FORMATION ASSEMBLY FOR LIQUID CONTROL APPARATUS

• Main Authors: KOUKETSU MASAYUKI, OKADA MASAYO, ITAFUJI HIROSHI
• Format: Patent
• Language: English; Korean
• Published: 22.01.2014
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING; NOZZLES; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SEPARATION; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; THEIR RELEVANT APPARATUS; TRANSPORTING

The purposes of the present invention are to provide a liquid control apparatus for improving attachment and removal of reticular formation assemblies, and to adhere the reticular formation assembly closely to the surface of the subject. A liquid gasifier (10) comprises: a first housing having the surface of subject (11a); a heater (70); a mesh (31); first and second holders (34A, 34B) which are attached on outer outline parts facing each other; a stem (38) supported by the first housing to be moved along a fixed direction being inclined to the surface of the subject; a cover bolt (35A); a cover bolt (35B); a coil spring for keeping the mesh close to the surface of the subject; and a cover member (80) for sealing the space around the surface of the subject by covering the mesh from the side heading the surface of the subject.