PHOTO MASK

The present invention provides a photo mask. The photo mask includes a transparent substrate, a pattern unit formed on the transparent substrate, and a light transmission unit which is formed on the transparent substrate, concentrates, and disperses light. According to the present invention, the pho...

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Bibliographic Details
Main Author BAE, YUN MI
Format Patent
LanguageEnglish
Korean
Published 21.01.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The present invention provides a photo mask. The photo mask includes a transparent substrate, a pattern unit formed on the transparent substrate, and a light transmission unit which is formed on the transparent substrate, concentrates, and disperses light. According to the present invention, the photo mask is capable of easily implementing fine patterns with a simple structure by forming a light transmission unit capable of concentrating and dispersing light on the transparent substrate.
Bibliography:Application Number: KR20120074954