A COMPOSITION FOR REMOVING ORGANIC-INORGANIC HYBRID ALIGNMENT LAYER

The present invention relates to a composition for removing an organic-inorganic hybrid alignment membrane, wherein the composition includes 20-90 wt% of acetal represented by chemical formula 1, 0.1-10 wt% of a basic compound, 1-30 wt% of polyhydric alcohol, and residual water agaisnt 100 wt% of co...

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Bibliographic Details
Main Authors HONG, HUN PYO, BANG, SOON HONG, KIM, WOO IL
Format Patent
LanguageEnglish
Korean
Published 30.12.2013
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The present invention relates to a composition for removing an organic-inorganic hybrid alignment membrane, wherein the composition includes 20-90 wt% of acetal represented by chemical formula 1, 0.1-10 wt% of a basic compound, 1-30 wt% of polyhydric alcohol, and residual water agaisnt 100 wt% of composition.
Bibliography:Application Number: KR20120065129