SHOWERHEAD ASSEMBLY WITH GAS INJECTION DISTRIBUTION DEVICES

Embodiments of the present invention generally provide a method and apparatus that may be utilized for deposition of Group III-nitride films using MOCVD and/or HVPE hardware. In one embodiment, the apparatus is a showerhead assembly made of multiple sections that are isolated from one another and at...

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Bibliographic Details
Main Authors OLGADO DONALD J.K, TAM ALEXANDER, CHANG ANZHONG, ACHARYA SUMEDH
Format Patent
LanguageEnglish
Korean
Published 13.12.2013
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:Embodiments of the present invention generally provide a method and apparatus that may be utilized for deposition of Group III-nitride films using MOCVD and/or HVPE hardware. In one embodiment, the apparatus is a showerhead assembly made of multiple sections that are isolated from one another and attached to a top plate. Each showerhead section has separate inlets and passages for delivering separate processing gases into a processing volume of a processing chamber without mixing the gases prior to entering the processing volume. In one embodiment, each showerhead section includes a temperature control manifold for flowing a cooling fluid through the respective showerhead section. By providing multiple, isolated showerhead sections, manufacturing complexity and costs are significantly reduced as compared to conventionally manufacturing the entire showerhead from a single block or stack of plates.
Bibliography:Application Number: KR20137006718