AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS

• Main Authors: VENKATARAMAN SHYAM SUNDAR, USMAN IBRAHIM SHEIK ANSAR, PINDER HARVEY WAYNE, LI YUZHUO, FRANZ DIANA, NOLLER BASTIAN
• Format: Patent
• Language: English; Korean
• Published: 06.12.2013
• Subjects: ADHESIVES; AGRICULTURE; ANIMAL HUSBANDRY; BASIC ELECTRIC ELEMENTS; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES, AS HERBICIDES; CHEMISTRY; DRESSING OR CONDITIONING OF ABRADING SURFACES; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; FISHING; FORESTRY; GRINDING; HUMAN NECESSITIES; HUNTING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; PERFORMING OPERATIONS; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS; POLISHES; POLISHING; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; PRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTSTHEREOF; SEMICONDUCTOR DEVICES; SKI WAXES; TRANSPORTING; TRAPPING

An aqueous polishing composition comprising (A) at least one water-soluble or water-dispersible compound selected from the group consisting of N-substituted diazenium dioxides and N'-hydroxy-diazenium oxide salts; and (B) at least one type of abrasive particles; the use of the compounds (A) for manufacturing electrical, mechanical and optical devices and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.