METHOD OF MANUFACTURING NITRIDE-GALLIUM-BASED SEMICONDUCTOR LIGHT EMITTING DEVICE
The present invention relates to a nitride-gallium based semiconductor light emitting device and comprises; a step which forms a light emitting structure including an an-type semiconductor layer, an active layer, and a p-type semiconductor layer made of a nitride semiconductor having Ga on a substra...
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Main Authors | , , |
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Format | Patent |
Language | English Korean |
Published |
22.11.2013
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention relates to a nitride-gallium based semiconductor light emitting device and comprises; a step which forms a light emitting structure including an an-type semiconductor layer, an active layer, and a p-type semiconductor layer made of a nitride semiconductor having Ga on a substrate; a step which forms a metal film on the p-type semiconductor layer and forms a Ga-metal compound by performing a thermal process; a step which removes the Ga-metal compound formed on the p-type semiconductor layer; a step which forms an electrode on the upper side of the p-type semiconductor layer in which the Ga-metal compound is removed. The feature of the present invention is to form gallium vacancy on the surface of the -type semiconductor layer by the response of the metal film and gallium of the p-type semiconductor layer in the step which forms the Ga-metal compound. |
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Bibliography: | Application Number: KR20120050962 |