LIQUID PROCESSING APPARATUS

PURPOSE: A liquid processing apparatus is provided to prevent processing liquid from being reattached to a substrate by vertically arranging a top guide ring and a bottom guide ring around the substrate. CONSTITUTION: A substrate holding unit horizontally holds a substrate. A rotation driving unit r...

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Bibliographic Details
Main Author MIZUNO TSUYOSHI
Format Patent
LanguageEnglish
Korean
Published 21.10.2013
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A liquid processing apparatus is provided to prevent processing liquid from being reattached to a substrate by vertically arranging a top guide ring and a bottom guide ring around the substrate. CONSTITUTION: A substrate holding unit horizontally holds a substrate. A rotation driving unit rotates the substrate holding unit. A processing liquid supply unit (411,412) supplies processing liquid to the substrate. A rotary cup (51) guides the processing liquid. A top guide ring (42) and a bottom guide ring (43) are separately arranged.
Bibliography:Application Number: KR20130038101