APPARATUS AND METHOD FOR TREATING SUBSTRATE

PURPOSE: A substrate processing device and a method thereof efficiently weaken the adhesion of foreign substances and remove the foreign substances on a substrate by spraying a medicinal fluid in different manners using a first nozzle and a second nozzle. CONSTITUTION: A housing (320) provides a spa...

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Bibliographic Details
Main Author NOH, HWAN IK
Format Patent
LanguageEnglish
Korean
Published 08.10.2013
Subjects
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
ATOMISING APPARATUS
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
NOZZLES
PERFORMING OPERATIONS
SEMICONDUCTOR DEVICES
SPRAYING APPARATUS
SPRAYING OR ATOMISING IN GENERAL
TRANSPORTING
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Summary:PURPOSE: A substrate processing device and a method thereof efficiently weaken the adhesion of foreign substances and remove the foreign substances on a substrate by spraying a medicinal fluid in different manners using a first nozzle and a second nozzle. CONSTITUTION: A housing (320) provides a space for processing a substrate (W). A spin head (340) supports and rotates the substrate. An injection unit (380) sprays a medicinal fluid onto the substrate. The injection unit includes a first nozzle (396) spraying a first medicinal fluid and a second nozzle (430) spraying a second medicinal fluid. The first nozzle is provided to atomize the first medicinal fluid. The second nozzle is provided to atomize the second medicinal fluid.
Bibliography:Application Number: KR20120031889