DRAWING METHOD AND METHOD OF MANUFACTURING ARTICLE

PURPOSE: A drawing method and a method for manufacturing article are provided to be applied to the manufacture of various articles including micro devices and devices of fine structure. CONSTITUTION: First line type patterns are self-aligned with a predetermined pitch (P) in a second direction. Cut...

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Bibliographic Details
Main Authors TSUJITA KOUICHIROU, MURAKI MASATO
Format Patent
LanguageEnglish
Korean
Published 08.08.2013
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A drawing method and a method for manufacturing article are provided to be applied to the manufacture of various articles including micro devices and devices of fine structure. CONSTITUTION: First line type patterns are self-aligned with a predetermined pitch (P) in a second direction. Cut patterns are drawn on the first line type patterns. The first line type patterns are formed on second line type patterns which are self-aligned with a predetermined pitch in a second direction in a first direction. The first line type patterns form a gate region. The second line type patterns form an isolation region and an active region. [Reference numerals] (AA) Active region; (BB) Isolation region; (CC) Gate region; (DD) Cut pattern; (EE) Contact
Bibliography:Application Number: KR20130007497