METHOD FOR DEPOSITING FILM AND FILM DEPOSITION SYSTEM

• Main Authors: JIANG YOUSONG, SHIONO ICHIRO, MIYAUCHI MITSUHIRO
• Format: Patent
• Language: English; Korean
• Published: 26.07.2013
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A method for depositing a film is provided, which enables to deposit an oil repellent film having an enhanced abrasion resistance properties not to mention being good enough for practical use. A film deposition system 1, wherein a substrate holder 12 having a substrate holding surface for holding a plurality of substrates 14 is provided rotatably to inside a vacuum container 10, is configured to comprise an ion source 38 provided to inside the vacuum container 10 to have a configuration and in an arrangement and/or a direction, by which an ion beam can be irradiated only to a partial region of the substrate holding surface, and a deposition source 34 provided to inside the vacuum container 10 in an arrangement and a direction, so that a film deposition material of an oil repellent film can be supplied to the whole region of the substrate holding surface; wherein an operation of the ion source 38 is stopped before starting an operation of the deposition source 34.