PROCESS CHAMBER

PURPOSE: A processing chamber is provided to compensate for the temperature drop in an edge of a disc by a skirt unit, thereby reducing the heat loss which is generated in a main disc. CONSTITUTION: A main disc (30) is installed at the lower part of a gas injector. The main disc comprises a skirt un...

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Bibliographic Details
Main Authors KIM, SU YEOL, KWAK, JAE CHAN
Format Patent
LanguageEnglish
Korean
Published 10.07.2013
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A processing chamber is provided to compensate for the temperature drop in an edge of a disc by a skirt unit, thereby reducing the heat loss which is generated in a main disc. CONSTITUTION: A main disc (30) is installed at the lower part of a gas injector. The main disc comprises a skirt unit (32). A quartz unit is installed at the lower part of the main disc. A purge gas movable unit moves the purge gas through the interval of the main disc and the quartz unit. A first pumping unit (40) inhales the source gas and the purge gas.
Bibliography:Application Number: KR20120000176