ETCHING RESIST COMPOSITION FOR SCREEN PRINTING

PURPOSE: An etching resist compostition for screen printing is provided to easily form a micro-pattern without the photocuring process and thermocuring process, have superior etchant resistance, and easily facilitate the stripping process. CONSTITUTION: An etching resist composition for screen print...

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Bibliographic Details
Main Authors LEE, SANG HAENG, LIM, MIN KI, CHOI, HYUNG SUB
Format Patent
LanguageEnglish
Korean
Published 02.07.2013
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:PURPOSE: An etching resist compostition for screen printing is provided to easily form a micro-pattern without the photocuring process and thermocuring process, have superior etchant resistance, and easily facilitate the stripping process. CONSTITUTION: An etching resist composition for screen printing includes liquid type plasticizer as the main solvent. The main solvent is over 50 weight% of the total solvent and the boiling point of it is 200-400 °C. The etching resist composition also includes binder resin and the binder resin includes the novolak group binder resin. The novolack group binder resin is a reaction product of aldehyde and aromatic alcohol. The average molecular weight of the binder region is 2,000-30,000 and the weight ratio of the binder resin and main solvent is 4:6-6:4.
Bibliography:Application Number: KR20110140058