METHOD FOR TREATING HYDROFLUORIC ACID WASTEWATER

PURPOSE: A method for treating hydrofluoric acid water is provided to easily collect reusable hydrofluoric acid, by efficiently removing silicon in the hydrofluoric acid water. CONSTITUTION: A method for treating hydrofluoric acid water comprises a step of film-separating hydrofluoric acid water inc...

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Main Authors SUZUKI KOTARO, FUKADA HIROSHI, UMEMOTO AYUMI, YUASA MASUO, HOSHIBA YASUYUKI, KATAYAMA KEI, MAEDA YASUKAZU
Format Patent
LanguageEnglish
Korean
Published 26.06.2013
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Summary:PURPOSE: A method for treating hydrofluoric acid water is provided to easily collect reusable hydrofluoric acid, by efficiently removing silicon in the hydrofluoric acid water. CONSTITUTION: A method for treating hydrofluoric acid water comprises a step of film-separating hydrofluoric acid water including silicon and fluorine, by enabling the hydrofluoric acid water in a film separation apparatus in a state of pH 6 or less. In the film separation step, alkali components are not added into the hydrofluoric acid water. The film separation apparatus uses a NF film or RO film. [Reference numerals] (25) Penetration water; (26) Non-penetration water
Bibliography:Application Number: KR20120082819