SUPPORT, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PURPOSE: A support is provided to minimize the warpage of a substrate by enhancing supporting degrees to the substrate while loading/unloading. CONSTITUTION: A support(1) includes a surface(20). The surface of the support supports a target. The surface of the support is divided into a main part and...

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Bibliographic Details
Main Authors SIJBEN ANKO JOZEF CORNELUS, GILISSEN NOUD JAN, SMEETS MARTIN FRANS PIERRE, FIEN MENNO, CUIJPERS MARTINUS AGNES WILLEM
Format Patent
LanguageEnglish
Korean
Published 11.06.2013
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A support is provided to minimize the warpage of a substrate by enhancing supporting degrees to the substrate while loading/unloading. CONSTITUTION: A support(1) includes a surface(20). The surface of the support supports a target. The surface of the support is divided into a main part and a mobile part(50). The mobile part moves between a retracted position and an extended position. When the mobile part is positioned at the retracted position, the mobile part is substantially on the same plane as the main part. When the mobile part is positioned at the extended position, the mobile part is protruded from the plane of the main part.
Bibliography:Application Number: KR20120138092