METHOD OF MANUFACTURING A NANOWIRE

PURPOSE: A method for manufacturing a nanowire is provided to separate a grating pattern from a nanowire by etching a sacrificial layer and improve uniformity. CONSTITUTION: A grating pattern is formed on a substrate(S1). A sacrificial layer is formed on the grating pattern(S3). A nanowire material...

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Bibliographic Details
Main Authors YOO, KYOUNG JONG, LEE, JUN, LEE, YOUNG JAE, KIM, JIN SU
Format Patent
LanguageEnglish
Korean
Published 08.05.2013
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES
NANOTECHNOLOGY
PERFORMING OPERATIONS
SEMICONDUCTOR DEVICES
SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
TRANSPORTING
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Summary:PURPOSE: A method for manufacturing a nanowire is provided to separate a grating pattern from a nanowire by etching a sacrificial layer and improve uniformity. CONSTITUTION: A grating pattern is formed on a substrate(S1). A sacrificial layer is formed on the grating pattern(S3). A nanowire material is deposited on the sacrificial layer. The nanowire is formed using a deposition process(S5). The sacrificial layer is etched to separate the grating pattern from the nanowire(S7). [Reference numerals] (AA) Start; (BB) End; (S1) Form a grating pattern on a substrate; (S3) Form a sacrificial layer on the grating pattern; (S5) Form a nanowire using slope deposition; (S7) Separate the grating pattern and the nanowire by etching the sacrificial layer
Bibliography:Application Number: KR20110111208