SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME

PURPOSE: A semiconductor device and a method for forming the same are provided to form an opening part which has a CD(Critical Dimension) appropriate for a contact part. CONSTITUTION: An aperture penetrates a dielectric layer(103) and includes a bottom part and a sidewall. A liner(107) is formed in...

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Main Authors WANG MEI YUN, CHEN FANG CHENG, CHEN HUANG MING, LAI CHIA HAN, LEI MING TA, WU CHII MING, CHEN YUNG CHUNG, TSAI WEN CHI
Format Patent
LanguageEnglish
Korean
Published 08.03.2013
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A semiconductor device and a method for forming the same are provided to form an opening part which has a CD(Critical Dimension) appropriate for a contact part. CONSTITUTION: An aperture penetrates a dielectric layer(103) and includes a bottom part and a sidewall. A liner(107) is formed in the sidewall and the bottom part of the aperture. A part of the liner is removed in the bottom part of the aperture to expose a part of the substrate(101). The substrate is cleaned. A conducting material is filled in the aperture.
Bibliography:Application Number: KR20110112996