APPARATUS FOR PROCESSING OF SUBSTRATE AND METHOD FOR PROCESSING OF SUBSTRATE

• Main Author: PARK, KUN JOO
• Format: Patent
• Language: English; Korean
• Published: 06.03.2013
• Subjects: BASIC ELECTRIC ELEMENTS; CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGYGENERATION, TRANSMISSION OR DISTRIBUTION; SEMICONDUCTOR DEVICES; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE

PURPOSE: An apparatus and a method for processing a substrate are provided to easily control process uniformity by replacing a supply tube according to the shape of an external spray hole. CONSTITUTION: A substrate is transferred between the inside and the outside of a bottom chamber through a path(108) formed in a sidewall of the bottom chamber. A susceptor(130) is installed in the bottom chamber. A support shaft(134) is connected to a lifting device(136) and rises and falls. A shower head(110) is arranged on the upper side of the susceptor and supplies reaction gas to the substrate and includes a plurality of supply tubes arranged in parallel. The supply tube includes an external tube with a plurality of external spray holes and a middle tube with a plurality of middle spray holes. [Reference numerals] (109) Pump; (120) Gas supply source; (122) RF power