APPARATUS FOR GRAPHENE ETCHING AND METHOD FOR GRAPHENE ETCHING USING THE SAME

PURPOSE: A graphene etching device and a graphene etching method using the same are provided to prevent additional etching by performing discharging without remaining reactive gas. CONSTITUTION: A graphene etching device is composed of a buffer chamber(200), an adsorption chamber(100), and a desorpt...

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Bibliographic Details
Main Authors OH, JONG SIK, YEOM, GEUN YOUNG, LIM, WOONG SUN
Format Patent
LanguageEnglish
Korean
Published 30.01.2013
Subjects
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
THEIR RELEVANT APPARATUS
TRANSPORTING
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Summary:PURPOSE: A graphene etching device and a graphene etching method using the same are provided to prevent additional etching by performing discharging without remaining reactive gas. CONSTITUTION: A graphene etching device is composed of a buffer chamber(200), an adsorption chamber(100), and a desorption chamber(300). A graphene substrate(500) is loaded in the buffer chamber. An adsorption process is performed in the adsorption chamber for the graphene substrate. A desorption process is performed in the desorption chamber for the graphene substrate. The buffer chamber is placed between the adsorption chamber and the desorption chamber. The buffer chamber includes a transfer device(210), and the transfer device transfers the graphene substrate to the inside of the adsorption chamber or the desorption chamber. The graphene substrate adsorbed in the adsorption chamber is transferred to the buffer chamber, in standby for a previously set time, and transferred to the desorption chamber. [Reference numerals] (AA) Exhaust
Bibliography:Application Number: KR20110072953