A FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

PURPOSE: A fluid handling structure for a lithography apparatus is provided to prevent imaging error caused by interfering bubbles on a substrate image and by transmittance beam. CONSTITUTION: A fluid handling structure(12) for a lithography apparatus comprises a gas supply inlet of a linear array,...

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Bibliographic Details
Main Authors CASTELIJNS HENRICUS JOZEF, ROPS CORNELIUS MARIA, ROSET NIEK JACOBUS JOHANNES, OVERKAMP JIM VINCENT, RIEPEN MICHEL, CORTIE ROGIER HENDRIKUS MAGDALENA, TEN KATE NICOLAAS
Format Patent
LanguageEnglish
Korean
Published 21.01.2013
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A fluid handling structure for a lithography apparatus is provided to prevent imaging error caused by interfering bubbles on a substrate image and by transmittance beam. CONSTITUTION: A fluid handling structure(12) for a lithography apparatus comprises a gas supply inlet of a linear array, and one or more meniscus pinning feature in the boundary region from a space accepting a liquid immersion to the outer region(11) of the liquid handling structure. The meniscus pinning features blocks the penetration of liquid immersion. The gas supply inlet at least partially surrounds the meniscus pining features. The gas supply opening supplies uniform gas flow at a unit length of the linear array. The linear array has the same or similar size as the gas supply inlet.
Bibliography:Application Number: KR20120073817