SEMICONDUCTOR DEVICES
PURPOSE: A semiconductor device is provided to improve reliability by maximizing the width of second impurity doping regions. CONSTITUTION: A driving circuit region includes a device isolation pattern, a gate electrode(120), a gate dielectric pattern, a first impurity doping region, and a driving tr...
Saved in:
Main Authors | , , , |
---|---|
Format | Patent |
Language | English Korean |
Published |
27.12.2012
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | PURPOSE: A semiconductor device is provided to improve reliability by maximizing the width of second impurity doping regions. CONSTITUTION: A driving circuit region includes a device isolation pattern, a gate electrode(120), a gate dielectric pattern, a first impurity doping region, and a driving transistor. A device isolation pattern defines an active part on a substrate. A gate electrode is arranged on the substrate and includes a closed loop type channel part(123). A gate dielectric pattern is arranged between the active part and the gate electrode. A first impurity doping region is arranged in the active part surrounded with the channel part and is separated from the device isolation pattern. A driving transistor is arranged in the active part outside the gate electrode and is separated from the first impurity doping region. |
---|---|
Bibliography: | Application Number: KR20110059022 |