SEMICONDUCTOR DEVICES

PURPOSE: A semiconductor device is provided to improve reliability by maximizing the width of second impurity doping regions. CONSTITUTION: A driving circuit region includes a device isolation pattern, a gate electrode(120), a gate dielectric pattern, a first impurity doping region, and a driving tr...

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Bibliographic Details
Main Authors HAN, SEUNG UK, CHOI, JAY BOK, LEE, DONG HYUN, JEON, NAM HO
Format Patent
LanguageEnglish
Korean
Published 27.12.2012
Subjects
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Summary:PURPOSE: A semiconductor device is provided to improve reliability by maximizing the width of second impurity doping regions. CONSTITUTION: A driving circuit region includes a device isolation pattern, a gate electrode(120), a gate dielectric pattern, a first impurity doping region, and a driving transistor. A device isolation pattern defines an active part on a substrate. A gate electrode is arranged on the substrate and includes a closed loop type channel part(123). A gate dielectric pattern is arranged between the active part and the gate electrode. A first impurity doping region is arranged in the active part surrounded with the channel part and is separated from the device isolation pattern. A driving transistor is arranged in the active part outside the gate electrode and is separated from the first impurity doping region.
Bibliography:Application Number: KR20110059022