INLINE DEPOSITION APPARATUS

• Main Authors: KIM, JIN KWANG, CHEON, JUN HYUK, KIM, SEUNG HUN, SEO, SANG JOON
• Format: Patent
• Language: English; Korean
• Published: 20.12.2012
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PURPOSE: An in-line deposition apparatus is provided to minimize the deterioration of an atomic or molecular layer when successively forming a plurality of deposition layers of the atomic or molecular layer on an object. CONSTITUTION: An in-line deposition apparatus(1000) comprises a chamber(100), a mounting unit(200) which is located inside the chamber to mount an object(10) and moved in a specific direction, a plurality of first deposition modules(300) which are arranged in a specific direction in the chamber to deposit a first layer on the object, and a plurality of second deposition modules(400) which are arranged between the adjacent first deposition modules in the specific direction to deposit a second layer on the object. [Reference numerals] (AA) First direction