THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF FABRICATING THE SAME
PURPOSE: A thin film transistor substrate and a manufacturing method thereof are provided to improve aperture ratio by eliminating a common line which is parallel to a gate line within a pixel region. CONSTITUTION: A gate line(GL) is arranged on a substrate in a first direction. A data line(DL) is a...
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Main Author | |
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Format | Patent |
Language | English Korean |
Published |
12.12.2012
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Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE: A thin film transistor substrate and a manufacturing method thereof are provided to improve aperture ratio by eliminating a common line which is parallel to a gate line within a pixel region. CONSTITUTION: A gate line(GL) is arranged on a substrate in a first direction. A data line(DL) is arranged in a second direction which is perpendicular to the gate line. A common line(CL) is arranged in the second direction which is parallel to the data line. A gate electrode is connected to the gate line. A source electrode is connected to the data line. |
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Bibliography: | Application Number: KR20110053026 |