EUV RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
An EUV radiation source that includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a reservoir configured to hold fuel at a temperature that is sufficiently high to maintain the fuel in liquid form, and a pressure vessel configured to contain the r...
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Main Authors | , , , |
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Format | Patent |
Language | English Korean |
Published |
12.10.2012
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Subjects | |
Online Access | Get full text |
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Summary: | An EUV radiation source that includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a reservoir configured to hold fuel at a temperature that is sufficiently high to maintain the fuel in liquid form, and a pressure vessel configured to contain the reservoir, the pressure vessel being at least partially thermally isolated from the reservoir. The EUV radiation source also includes a laser radiation source configured to irradiate fuel supplied by the fuel supply at the plasma formation location. |
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Bibliography: | Application Number: KR20127019655 |