COPOLYMER BASED ON MONOMER CONTAINING PHOSPHORYLCHOLINE-LIKE GROUP, BOOSTER FOR BLOCKING ULTRAVIOLET LIGHT, PERSONAL CARE PRODUCT FOR BLOCKING ULTRAVIOLET LIGHT

• Main Authors: JEON, HYE YOUNG, LEE, MAE IN, KOO, BO MI
• Format: Patent
• Language: English; Korean
• Published: 19.09.2012
• Subjects: CHEMISTRY; COMPOSITIONS BASED THEREON; HUMAN NECESSITIES; HYGIENE; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MEDICAL OR VETERINARY SCIENCE; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES; SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS; THEIR PREPARATION OR CHEMICAL WORKING-UP

PURPOSE: A phosphorylcholine-like group-containing monomer-based copolymer is provide to provide SPF(sun protection factor) and PA(protect A) boosting effect to a personal care product for UV shielding and to provide improved moisturizing performance and biocompatibility at the same time. CONSTITUTION: A phosphorylcholine-like group-containing monomer-based copolymer comprises one or more of first monomers selected from a group consisting of alkyl ester of acrylic acid, alkyl ester of methacrylic acid, and alkenyl ester of alkanoic acid, a second monomer different with the first monomer, which is one or more selected from a group consisting of acrylic alkyl ester, alkyl ester of methacryl acid, alkenyl ester of alkanoic acid, and at least one or more phosphorylcholine-line group-containing monomers expressed in chemical formula 1.