FILM FORMING APPARATUS

• Main Authors: IIO ITSUSHI, ITO HIDEHIKO
• Format: Patent
• Language: English; Korean
• Published: 12.09.2012
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PURPOSE: A film forming apparatus is provided to detect the existence of a work piece in a film forming chamber by projecting a sensing light beam through the antiadhesive glass of a viewport. CONSTITUTION: A film forming apparatus comprises a film forming chamber(2) which receives a work piece(W), a transfer unit(7) which is installed inside the film forming chamber and transfers the work piece, a view port(13) which is installed in a wall(3a) dividing the film forming chamber and has an antiadhesive glass(27) letting light through, a travelling sensor(11) which is installed outside the film forming chamber and projects a sensing light beam through the antiadhesive glass of the view port to detect the existence of a work piece inside the film forming chamber, and a heater(31) for reducing the accumulation of a film forming material on the antiadhesive glass.