LITHOGRAPHIC APPARATUS AND STAGE SYSTEM

• Main Authors: VAN DER TOORN JAN GERARD CORNELIS, BAGGEN MARK CONSTANT JOHANNES, STARREVELD JEROEN PIETER, KRUIJSWIJK STEFAN GEERTE, VERVOORDELDONK MICHAEL JOHANNES, BAGGEN MARCEL KOENRAAD MARIE
• Format: Patent
• Language: English; Korean
• Published: 05.09.2012
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: A lithographic apparatus and a stage system are provided to easily estimate a long stroke actuator element of an internal bending mode and a torsion mode by using a redundancy of a plurality of sensors. CONSTITUTION: An illumination system(IL) receives a radiation beam(B) from a radiation source(SO). The illumination system includes an adjuster(AD) which adjusts the angular intensity distribution of the radiation beam. The illumination system includes other various components, such as an integrator(IN) and a condenser(CO). A projection system(PS) focuses the radiation beam on a target area(C) of a substrate(W). A mask table(MT) supports a patterning device(MA). The mask table is connected to a first positioning device(PM). The first positioning device accurately positions the pattering device with respect to the path of the radiation beam.