LITHOGRAPHIC APPARATUS AND STAGE SYSTEM

PURPOSE: A lithographic apparatus and a stage system are provided to easily estimate a long stroke actuator element of an internal bending mode and a torsion mode by using a redundancy of a plurality of sensors. CONSTITUTION: An illumination system(IL) receives a radiation beam(B) from a radiation s...

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Bibliographic Details
Main Authors VAN DER TOORN JAN GERARD CORNELIS, BAGGEN MARK CONSTANT JOHANNES, STARREVELD JEROEN PIETER, KRUIJSWIJK STEFAN GEERTE, VERVOORDELDONK MICHAEL JOHANNES, BAGGEN MARCEL KOENRAAD MARIE
Format Patent
LanguageEnglish
Korean
Published 05.09.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: A lithographic apparatus and a stage system are provided to easily estimate a long stroke actuator element of an internal bending mode and a torsion mode by using a redundancy of a plurality of sensors. CONSTITUTION: An illumination system(IL) receives a radiation beam(B) from a radiation source(SO). The illumination system includes an adjuster(AD) which adjusts the angular intensity distribution of the radiation beam. The illumination system includes other various components, such as an integrator(IN) and a condenser(CO). A projection system(PS) focuses the radiation beam on a target area(C) of a substrate(W). A mask table(MT) supports a patterning device(MA). The mask table is connected to a first positioning device(PM). The first positioning device accurately positions the pattering device with respect to the path of the radiation beam.
Bibliography:Application Number: KR20120018863